Quanta RPS
VHF Remote Plasma Source with Advanced Functionality for Demanding Thin Film Applications.
Description
For ultimate control of process parameters, the VHF RPS lets you customize the radical mix in the plasma. Benefit from a vast ignition and operating ranges, and a high density of reactives.
Overview
Combining VHF energy and CCP architecture, the Quanta® remote plasma source (RPS) enables sophisticated plasma generation and expansion into new thin-film processes not possible with traditional RPS or in-situ plasma generation.
Capable of generating very low energy plasma, Quanta RPS enables damage-free processing of smaller geometries for next-generation chip creation.
Quanta is capable of igniting in-process gases, eliminating the need for argon and removing the effect of the ignition process on the wafer. With an extremely wide ignition and operating range, Quanta has capabilities that vastly outperform other RPS units.
FEATURES
- Enhanced ignition of in-process gas; wide range of flow and pressure
- Integrated solid-state impedance matching and frequency tuning
- Virtual Front Panel allows user control and monitoring of operational features and parameters
- High-purity Al2O3 ceramics on all plasma-wetted surfaces
- Pulsing capable
